Micro-machined deep silicon atomic vapor cells
Journal of Applied Physics
132,
134401
(2022)
Using a simple and cost-effective water jet process, silicon etch depth limitations are overcome to realize a 6 mm deep atomic vapor …
S. Dyer, P. F. Griffin, A. S. Arnold, F. Mirando, D. P. Burt, E. Riis, J. P. McGilligan